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Material: RO4200-1,RO4210-2
Size:
Circular targets:Diameter 10mm up to 400mm x Thickness 2mm up to 28mm
Rectangular targets:Thickness 1mm up to 20.32mm x Width up to 800mm x Length up to 3000mm
Purity:≥99.9% or 99.95%
Material Features：
high product density, good product compactness and uniform crystal grains;
Higher machining property;
Relative density of targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um; thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation: over 95%.
Conventional density: ≥8.5 g/cm3
Niobium Target Parameters | ||||
Recrystallization | 95％min | |||
Grain size | ASTM 4 or finer | |||
Surface finish | 16Rms max. or Ra 0.4 ( RMS64 or better) | |||
Flatness | 0.1mm or 0.15％ max | |||
Tolerance | +/-0.010" on all dimensions | |||
Impurity Content | Ta | ≤500ppm | Cr | ≤20ppm |
N | ≤370ppm | H | ≤19ppm | |
Ni | ≤20ppm | Fe | ≤80ppm | |
Ti | ≤20ppm | Mo | ≤30ppm | |
W | ≤50ppm | Cu | ≤10ppm | |
Mn | ≤20ppm | Al | ≤20ppm | |
C | ≤260ppm | |||
Si | ≤20ppm | |||
Original Powder → HIP → Machine Process → Surface Treatment → Finished Products →Packaging → Inspection
Niobium sputtering target is mainly used in surface engineering materials, such as shipbuilding, chemical industry, liquid crystal display (LCD) and heat resistance, corrosion resistance and high conductivity coating industry, thin film solar industry, low radiation glass industry, flat panel display industry, optical coating industry, tools and decorative coating industry.
In addition to niobium sputtering target, we can also provide niobium-germanium alloy, niobium-tin alloy, niobium-zirconium alloy, niobium-hafnium alloy, niobium-titanium alloy, molybdenum-niobium alloy, aluminum-niobium alloy, lithium niobate alloy and other sputtering targets.
Specialization: At Changsheng Titanium, we specialize in producing customized Niobium Sputtering Targets for both commercial and research applications. Our expertise allows us to create tailored solutions that meet your specific requirements.
Custom Compositions: We can create custom compositions for new proprietary technologies. Our team works closely with you to understand your needs and develop the most suitable Niobium Sputtering Target composition.
Variety of Products: In addition to our Niobium Sputtering Targets, we offer a wide range of other magnetron sputtering targets, evaporation sources, and deposition materials. These are listed by material throughout our website for easy reference.
Quality Assurance: All our products, including our customized Niobium Sputtering Targets, undergo rigorous quality checks to ensure they meet our high standards and your expectations.
Expert Support: Our team of experts is always ready to provide support and advice, helping you choose the right materials and compositions for your needs.
No.26 Baotai Road, Weibin District, Baoji City, Shaanxi, China.
No.26 Baotai Road, Weibin District, Baoji City, Shaanxi, China.
